Thin-layer Deposition: CVD, Ion Implantation and Epitaxy

The global chemical vapor deposition (CVD) market is expected to increase from $5 billion in 2014 to nearly $6.8 billion by the end of 2019, a compound annual growth rate (CAGR) of 6.3% for the five-year period, 2014 to 2019.

Report Includes

• An overview of the global markets for thin-layer deposition technologies, including chemical vapor deposition (CVD), ion implantation and epitaxy.
• Analyses of global market trends, with data from 2013, estimates for 2014, and projections of CAGRs through 2019.
• Discussion of the advantages and limitations of each technology.
• Domestic and international technological issues.
• Analysis of the industry's manufacturing capacity and consumption by various regional markets.

• The global market for chemical vapor deposition (CVD) will increase from $7.0 billion in 2007 to an estimated $7.3 billion by the end of 2008. It should reach $11.8 billion by 2013, a compound annual growth rate (CAGR) of 10.2%.
• The ion implantation segment will grow at a CAGR of 10.1% between 2008 and 2013 and be worth $4.4 billion by the end of the study period.
• Molecular beam epitaxy (MBE) equipment is expected to reach $475.4 million in 2008. It is projected to grow at an 8.1% CAGR through the end of the forecast period to reach $701.3 million by 2013.

• The total market for ion implantation equipment, services and materials is estimated at $1.05 billion in 2001 and is expected to rise to $3.41 billion in 2006, an average annual growth rate (AAGR) of 26.6%.
• By contrast, ion implantation equipment and materials shipments both fell by 49% in 2001, the largest declines ever.
• The total market for MBE equipment, services and materials is estimated to be $249 million in 2001, increasing to $1.05 billion in 2006 at an AAGR of 33.3%. Despite economic conditions, MBE equipment and materials shipments increased in 2001.
• Spurring growth are the semiconductor merchant wafer markets. These will grow strongly through the period, particularly for thin-film silicon-on-insulator wafers made by ion implantation.
• By 2006, the service markets for ion implantation and MBE are expected to be nearly as large as the respective equipment markets.

• The value of worldwide shipments of PVD equipment reached $3.4 billion by 1999. Shipments are forecast to grow in value by 12.7% and reach $3.9 billion by the end of 2000, and at an average annual rate of 11.3% to reach $6.7 billion by 2005.
• The value of materials to be deposited by PVD reached $474.2 million in 1999. It is projected to grow by 13.5% to reach $538.2 million by 2000 and at an average annual rate of 11.9% to reach $943.9 million by 2005.
• The value of PVD services totaled $766.9 million in 1999. They will grow in value by 9.4% to reach $838.9 million by 2000 and at an average annual rate of 9.3% to reach $1.3 billion by 2005.

• The value of worldwide shipments of CVD equipment reached $3.7 billion by 1999. Shipments are forecast to grow in value by 12.9% and reach $4.2 billion by the end of 2000, and at an average annual rate of 11.0% to reach $7.1 billion by 2005.
• The value of materials to be deposited by CVD reached $450.8 million in 1999. It is projected to grow by 12.7% to reach $508 million by 2000 and at an average annual rate of 10.9% to reach $849.7 million by 2005.
• The microelectronics industry, encompassing semiconductors, components, and flat panel displays represents the largest market for CVD equipment, materials and services. This sector will grow at an AAGR of about 12% through the forecast period. The growth of materials in this market will be led by dielectric and diamond-like films as device geometries continue to shrink and levels expand.